Heavily p-doped silicon
5 Silicon wafer + 20 Etching solution + 50 Cold clean air + 5 Nexelit plate → 5 Heavily p-doped silicon
Compatible machines Gas processing unit MK 01 · Gas processing unit MK 02 · Gas processing unit MK 03 · Gas processing unit MK 04.
Research tier pY science pack 3. Semiconductor doping 2
8 base seconds per batch. Fractional outputs are average yields.