Etching solution
100 Phosphoric acid + 100 Sulfuric acid + 50 Hydrogen peroxide + 10 Lard → 150 Etching solution
Compatible machines Chemical plant MK 01 · Chemical plant MK 02 · Chemical plant MK 03 · Chemical plant MK 04.
Research tier pY science pack 2. Semiconductor doping
10 base seconds per batch. Fractional outputs are average yields.