Lightly n-doped silicon
5 Silicon wafer + 20 Phosphine gas + 20 Etching solution → 10 Lightly n-doped silicon
Compatible machines Gas processing unit MK 01 · Gas processing unit MK 02 · Gas processing unit MK 03 · Gas processing unit MK 04.
Research tier pY science pack 2. Semiconductor doping
5 base seconds per batch. Fractional outputs are average yields.